Laser cleaning uses concentrated laser radiation to evaporate impurities from the layer. The impurities are affected by ultra-short laser pulses (μs-ms), which generate heat and heat-induced pressure – the high temperature inside the material creates a high pressure that causes it to evaporate.

Almost no waste material is generated during laser cleaning, because most of the impurities evaporate, thanks to the high efficiency of the laser resonators used, the cleaning process has very low operating costs. Laser cleaning is a non-contact, non-abrasive method that is very gentle on the surface of the material. Since the course of the interaction of laser radiation with the material depends on the material, it is possible to set the cleaning parameters so that the substrate remains undamaged after cleaning.