The DUVLS (Deep Ultraviolet Laser Source) module is designed for efficient generation of second (532 nm) and third (355 nm) harmonic wavelengths from nanosecond-pulsed infrared lasers (Nd:YAG and Yb:YAG). Developed with flexibility and scientific precision in mind, this prototype represents a foundation for applications requiring high beam quality, short wavelengths, and rapid adaptability.
Key Technical Parameters
- Laser input: 1064 nm (Nd:YAG), 1030 nm (Yb:YAG), up to 10 J, 10 ns, 20 Hz
- SHG efficiency: > 74% at 532 nm
- THG efficiency: > 55% at 355 nm
- Output energy: 7.4 J (green), 5.5 J (UV)
- Beam size: 20 mm × 20 mm
- Switching time: Automated motorized harmonic switching < 10 s
- Attenuation: Integrated output beam attenuators (0.1–100%) without loss of beam quality
- Control: Integrated touchscreen (HMI) and external control via Modbus TCP/Profinet
Application Areas
- Semiconductor processing (annealing, lithography)
- Precision micromachining and structuring of sensitive materials
- Thin-film processing and UV laser coating preparation
- Scientific research in nonlinear optics and photon control
Physical Specifications
| Optical Module (current prototype) |
1087 × 958 × 274 mm / 135 kg |
| Cabinet (current prototype) |
767 × 431 × 308 mm / 20 kg |
| Cooling |
Water-cooled, dual circuits for optics and beam dump |
| Dust protection / Interlocks |
Yes, safety-compliant housing with interlock connectors |
| Note |
Final dimensions may be reduced in future production-ready version |